Our solution

Nanosized designs and manufactures a single-wafer cleaning tool for semiconductor manufacturing, built on patented technology. The system is used at critical process steps in the production flow and integrates with today’s leading technologies. This enables customers to improve product quality, increase overall yield, and significantly reduce both water consumption and resource usage.

Our proprietary technology helps clients minimize contamination risks, improve rinse uniformity, and maintain consistent process control in high-precision fabrication environments.